Electroplating Chemistries and Methods of Forming Interconnections

ABSTRACT

A method comprising forming an interconnection opening through a dielectric material to a contact point; and electroplating a interconnection comprising copper in the contact opening using an electroplating bath comprising an alkoxylated sulfopropylated alkylamine. A method comprising forming an interconnection opening through a dielectric material to a contact point; lining the interconnection opening with a barrier layer and a seed layer; and electroplating an interconnection comprising copper in the contact opening using an electroplating bath comprising an alkoxylated sulfopropylated alkylamine.

BACKGROUND

1. Field

Integrated circuit processing.

2. Background

Modern integrated circuits use conductive interconnections to connectthe individual devices on a chip or to send and/or receive signalsexternal to the chip. One popular type of interconnection are copperinterconnections (lines) that coupled to individual devices, includingother interconnections (lines) by interconnections through vias.

A typical method of forming an interconnection, particularly a copperinterconnection, is a damascene process. A typical damascene processinvolves forming a via and an overlying trench in a dielectric to anunderlying circuit device, such as a transistor or an interconnection.The via and trench are then lined with a barrier layer of a refractorymaterial, such as titanium nitride (TiN), tantalum (Ta), tantalumnitride (TaN) or their combinations. The barrier layer serves, in oneaspect, to inhibit the diffusion of the interconnection material thatwill subsequently be introduced in the via and trench into thedielectric. Next, a suitable seed material is deposited on the wall orwalls of the via and trench. Suitable seed materials for the depositionof copper interconnection material include copper (Cu), nickel (Ni), andcobalt (Co). Interconnection material, such as copper, is then depositedby electroplating or physical deposition in a sufficient amount to fillthe via and trench and complete the interconnection structure. Onceintroduced, the interconnection structure may be planarized and adielectric material (including an interlayer dielectric material)introduced over the interconnection structure to suitably isolate thestructure.

Advancements in integrated circuit processing have dictated that a linewidth of an interconnection structure and therefore its correspondencevia and trench openings be reduced. As line widths are reduced to 60nanometers or less, aspect ratios, measured as a thickness of thedielectric relative to a line width of the opening of the via/trench,can be on the order of four to one or five to one (e.g., assuming adielectric thickness on the order of 200 nanometers). When theinterconnect openings are lined with a barrier layer and a seedmaterial, the opening left for plating copper is very narrow making itincreasingly difficult to electroplate copper into the openings (e.g.,electroplating copper into openings having aspect ratios that mayapproach 20 to one or greater). If the thickness of the barrier layerand/or seed material is reduced, the electroplating of copper may becompromised. If the thickness of the barrier layer and/or seed materialare too thick, the combined thickness can “pinch-off” theinterconnection opening leading to voids even before plating. Thus, itremains a challenge to achieve an optimum barrier layer and seedmaterial thickness for a continuous coverage on interconnection openingside walls and a wide enough opening of features for electroplating.

BRIEF DESCRIPTION OF THE DRAWINGS

Features, aspects, and advantages of embodiments will become morethoroughly apparent from the following detailed description, appendedclaims, and accompanying drawings in which:

FIG. 1 shows a schematic, cross-sectional side view of an integratedcircuit substrate having a dielectric layer formed thereon with a via toa contact opening and a trench formed over the via.

FIG. 2 shows the structure of FIG. 1 following the formation of abarrier layer and a seed material in the interconnect opening.

FIG. 3 shows the structure of FIG. 2 following the electroplating of aninterconnect material including copper in the interconnect opening.

DETAILED DESCRIPTION

FIG. 1 shows a portion of an integrated circuit structure, such as aportion of a wafer (e.g., silicon wafer) designated for circuit devicesto form a microprocessor chip. Structure 100 includes substrate 110 suchas a silicon substrate. Substrate 110 may be the wafer substrate havingcircuit devices, including transistors, thereon as well as one or morelevels of interconnection to devices. A typical integrated circuit suchas a microprocessor chip may have, for example, five or moreinterconnection layers or levels separated from one another bydielectric material. FIG. 1 shows contact point 120 that may be acircuit device formed on or in a wafer/substrate or an interconnectionline formed above the substrate to devices on the wafer. It is to beappreciated that the techniques described herein may be used for variousinterconnections within an integrated circuit including to circuitdevices and other interconnections. In this sense, contact point 120represents such devices or interconnections wherein an interconnectioncontact is made.

FIG. 1 illustrates a cross-sectional side view of a portion of asubstrate. Overlying substrate 110 is dielectric material 130.Dielectric material 130 is, for example, silicon dioxide (SiO₂) formedby a tetraethyl orthosilicate (TEOS) or plasma enhanced chemical vapordeposition (PECVD) source. Dielectric material 130 may also be amaterial having dielectric constant less than the dielectric constant ofSiO₂ (e.g., a “low k” material), including polymers.

FIG. 1 shows via 170 through dielectric material 130 to expose contactpoint 120. FIG. 1 also shows trench 175 formed in a portion ofdielectric material 130 over via 170. A trench and via may be formedaccording to known techniques by, for example, initially using a mask,such as a photoresist mask to define an area (e.g., a cross-sectionalarea) on a surface of dielectric material 130 (e.g., a top surface asviewed) for a via opening and etching the via through dielectricmaterial 130 with a suitable chemistry, such as, for example, a CH₃/CF₄or C₄F₈ etch chemistry for SiO₂. The mask may then be removed (such asby an oxygen plasma to remove photoresist) and a second mask patternedto define an area for a trench opening. Trench opening is patterned toextend a distance into or out of the page, possibly over multiple viasincluding via 170. A subsequent mask and etch is introduced to form atrench and the second mask is removed leaving the substrate shown inFIG. 1.

Referring to FIG. 1, a line width, w, is defined as a width of trench175 formed in dielectric 130. It is appreciated that a width of trench175 may be similar to a diameter of via 170. FIG. 1 shows trench 175appearing to have a slightly larger width than a diameter of vai 170.FIG. 1 also shows dielectric material having a thickness, t, measuredfrom contact point 120 to a height of dielectric material 130 onsubstrate 110. In one embodiment, dielectric material 130 has athickness, t, on the order of 200 nanometers. In one embodiment, adesired line width, w, for trench 175 is less than 60 nanometers,including 50 nanometers or less. Accordingly, an aspect ratio of thetrench and via opening, measured as the thickness, t, of dielectricmaterial 130 to line width, w, is on the order of four to one to five toone.

FIG. 2 shows the substrate of FIG. 1 following the formation of abarrier layer and seed material along the side walls of via 170 andtrench 175. In one embodiment, barrier layer 140 is deposited to athickness on the order of 10 to 30 nanometers depending on the desiredcharacteristics of the barrier layer. For example, barrier layer 140, ischosen, in one embodiment, to be effective to inhibit interconnectmaterial diffusion, such as copper diffusion into dielectric material130. Barrier layer 140 may also be chosen for its adhering properties todielectric material 130. Suitable materials for barrier layer 140include, but are not limited to, tantalum (Ta), tantalum nitride (TaN),tantalum silicon nitride (TaSiN), tungsten (W), tungsten nitride (WN),tungsten silicon nitride (WSiN), titanium (Ti), titanium nitride (TiN),titanium silicon nitride (TiSiN) and cobalt (Co). Barrier layer 140 maybe introduced by chemical vapor deposition. In one embodiment, barrierlayer 140 is introduced as a blanket over dielectric material 130 andalong the side walls of via 170 and trench 175 and on contact point 120(i.e., at the bottom of via 170 as viewed).

Referring to FIG. 2, overlying barrier layer 140 along the side wallsand bottom of via 170 and trench 175 is seed material 150. Seed material150 is used, in one sense, in connection with a subsequentelectroplating process to form an interconnection in via 170 and trench175. While barrier layer 140 may be a conductive material such as atitanium or tantalum compound that may be capable of carrying a currentutilized in a electroplating process, barrier layer 140 may also not bea good conductor and may cause non-uniform current flow which, in turn,may adversely affect an electroplating process and the reliability ofthe interconnection. Seed material 150, on the other hand, is selectedto generally provide a uniform current flow during an electroplatingprocess. Moreover, seed material 150 may be selected to provide enhancedadhesion of the subsequently formed interconnection to the substrate.

In one embodiment, seed material 150 is, for example, a copper materialintroduced using physical vapor deposition (PVD) techniques. A thicknessof seed material 150 along the side walls and bottom of via 170 andtrench 175 of three to 20 nanometers is suitable for an embodiment.

FIG. 3 shows structure 100 after filling via 170 and trench 175 withinterconnection material 160 of, for example, a copper material. Onetechnique for depositing interconnection material 160 of a coppermaterial is an electroplating process. By way of example, a typicalelectroplating process involves introducing a substrate (e.g., a wafer)into an aqueous solution or bath containing metal ions, such as a coppersulfate-based solution, and reducing the metal ions (reducing theoxidation number) to a metallic state by applying current between thesubstrate with the seed material and an anode of an electroplating cellin the presence of the solution. Referring to FIG. 3, copper metal isdeposited on to seed material 150 to fill via 170 and trench 175 andform copper interconnection material 160.

An electroplating aqueous solution or bath typically contains metalions, provided by dissolved copper sulfate, and an acid such as sulfuricacid (H₂SO₄) to increase conductivity. The plating bath also may includea suppressor additive and an anti-suppressor additive. In oneembodiment, a suppressor additive is selective to inhibit plating onside walls of via 170 and trench 175. Without wishing to be bound by thetheory, it is believed that the suppressor additive is selected for sidewalls of a trench and via because a suppressor additive tends to diffusefrom the bulk solution and on to side walls due to transportlimitations. An anti-suppressor additive is selected, in one embodiment,to act as a catalyst for a plating reaction, particularly at the bottomof a via such as, the bottom of via 170.

In one embodiment, a plating bath such as described includes asuppressor additive of a compound selected from the group of alkoxylatedsulfopropylated alkylamines. A suitable alkoxylated sulfopropylatedalkylamine includes, but is not limited to, a reaction product of alkoxyalkylated alkylamine and alkyl sultone. The alkoxy alkylated alkylaminehas the general formula:

where n ranges from 2 to 200. X and Y are alkyl chains, with generalmolecular structure CmH₂m+1, where m ranges from 1 to 100, particularlymethyl (Ch₃), ethyl (C₂H₅), propyl (C₃H₇), or butyl (C₄H₉) groups. X andY can be polyethylene glycol polymeric chains and derivatives thereof.Particular examples of the reactant alkyl sultone include, but are notrestricted to 1,3-propane sultone and 1,4-butane sultone.

A suitable amount of a suppressor additive of an alkoxylatedsulfopropylated alkylamine in an electroplating bath for a copperinterconnection is on the order of 10 to 1000 parts per million.

A typical anti-suppressor additive is a disulfide compound. In oneembodiment, a suitable anti-suppressor additive is bis-3-sulfopropyldisodium sulfonate.

In addition to the components of a copper ion source, an acid, asuppressor additive and an anti-suppressor additive, a plating bath mayalso include a leveler, such as a nitrogen-containing compound.

By using a plating bath such as described, including an alkoxylatedsulfopropylated alkylamine as a suppressor additive, an electroplatingprocess may be utilized to fill interconnection openings having linewidths below 60 nanometers, including line width of 50 nanometers orless, with improved bottom-up filling of the interconnection opening aswell as minimal voids. The suppressor additive also a relatively narrowmolecular weight distribution (measured using mass spectroscopy) whichis expected to provide bath stability and larger operating processwindows for deposition offering an advantage over other platingchemistries that use suppressor additives with low molecular weightunstable species that degrade an electroplating bath.

It is believed that a suppressor additive of the group alkoxylatedsulfopropylated alkylamine suppresses plating on the trench/via sidewalls allowing the via bottom to plate at higher rates. It is alsobelieved the suppressor additive of the group alkoxylatedsulfopropylated alkylamine tends to interact with the anti-suppressoradditive in the plating bath causing the anti-suppressor additive toadsorb preferentially on the bottom of a via, thereby generating animproved (e.g., increased) bottom-up fill rate.

In the preceding detailed description, reference is made to specificembodiments thereof. It will, however, be evident that variousmodifications and changes may be made thereto without departing from thebroader spirit and scope of the following claims. The specification anddrawings are, accordingly, to be regarded in an illustrative rather thana restrictive sense.

1. A method comprising: forming an interconnection opening through adielectric material to a contact point; and electroplating aninterconnection comprising copper in the interconnection opening usingan electroplating bath comprising an alkoxylated sulfopropylatedalkylamine.
 2. The method of claim 1, wherein the interconnectionopening comprises a base defined by the contact point and a sidewall andprior to plating, the method further comprising: seeding theinterconnection opening with a conductive material along the base andthe sidewall.
 3. The method of claim 2, wherein prior to seeding, themethod comprises: forming a barrier layer along the base and sidewall.4. The method of claim 1, wherein a line width of the interconnectionopening is 60 nanometers or less.
 5. The method of claim 1, wherein anaspect ratio of the interconnection opening defined as a thickness ofthe dielectric material relative to a line width is greater than four toone.
 6. The method of claim 1, wherein the alkoxylated sulfopropylatedalkylamine comprises a reaction product of an alkoxy alkylatedalkylamine and an alkyl sultone.
 7. The method of claim 6, wherein thealkoxy alkylated alkylamine has the general formula:

where n ranges from 2 to 200, X and Y are alkyl chains, with generalmolecular structure C_(m)H_(2m+1), where m ranges from 1 to 100,polyethylene glycol chains or derivatives thereof.
 8. The method ofclaim 7, wherein the alkyl sultone is selected from 1,3-propane sultoneand 1,4-butane sultone.
 9. The method of claim 6, wherein aconcentration of the alkoxylated sulfopropylated alkylamine in theelectroplating bath is 10 to 1000 parts per million.
 10. A methodcomprising: forming an interconnection opening through a dielectricmaterial to a contact point; lining the interconnection opening with abarrier layer and a seed layer; and electroplating an interconnectioncomprising copper in the interconnection opening using an electroplatingbath comprising an alkoxylated sulfopropylated alkylamine.
 11. Themethod of claim 10, wherein a line width of the interconnection openingis 60 nanometers or less.
 12. The method of claim 10, wherein an aspectratio of the interconnection opening defined as a thickness of thedielectric material relative to a line width is greater than four toone.
 13. The method of claim 10, wherein the alkoxylated sulfopropylatedalkylamine comprises a reaction product of an alkoxy alkylatedalkylamine and an alkyl sultone.
 14. The method of claim 13, wherein thealkoxy alkylated alkylamine has the general formula:

where n ranges from 2 to 200, X and Y are alkyl chains, with generalmolecular structure C_(m)H_(2m+1), where m ranges from 1 to 100,polyethylene glycol chains or derivatives thereof.
 15. The method ofclaim 14, wherein the alkyl sultone is selected from 1,3-propane sultoneand 1,4-butane sultone.
 16. The method of claim 13, wherein aconcentration of the alkoxylated sulfopropylated alkylamine in theelectroplating bath is 10 to 1000 parts per million.
 17. Anelectroplating bath comprising: a copper salt; a suppressing additivecomprising an alkoxylated sulfopropylated alkylamine; and ananti-suppressing additive.
 18. The electroplating bath of claim 17,wherein the alkoxylated sulfopropylated alkylamine comprises a reactionproduct of an alkoxy alkylated alkylamine and an alkyl sultone.
 19. Theelectroplating bath of claim 18, wherein the alkoxy alkylated alkylaminehas the general formula:

where n ranges from 2 to 200, X and Y are alkyl chains, with generalmolecular structure C_(m)H_(2m+1), where m ranges from 1 to 100,polyethylene glycol chains or derivatives thereof.
 20. Theelectroplating bath of claim 19, wherein the alkyl sultone is selectedfrom 1,3-propane sultone and 1,4-butane sultone.
 21. The electroplatingbath of claim 417, wherein the alkoxylated sulfopropylated alkylamine ispresent in the electroplating bath in a concentration on the order of 10to 1000 parts per million.